S. Corre et al., NUMERICAL-SIMULATION AND VALIDATION OF THE PELTIER PULSE MARKING OF SOLID LIQUID INTERFACES/, Journal of crystal growth, 180(3-4), 1997, pp. 604-614
We describe a numerical approach of the solidification of binary alloy
s to study the motion of a crystal/melt interface submitted to current
pulses involving a modification of the dopant concentration field. Fo
r the thermal aspect, the Thomson effect, the Peltier effect and Joule
heating have been included in the heat flow. For the solutal segregat
ion, our model is based on mass transports which occur in the liquid p
hase, namely diffusion and convection. Numerical computations are vali
dated by comparison with experimental data and thus could find applica
tions in the prediction of the effects of Peltier pulse marking in cry
stal growth.