NUMERICAL-SIMULATION AND VALIDATION OF THE PELTIER PULSE MARKING OF SOLID LIQUID INTERFACES/

Citation
S. Corre et al., NUMERICAL-SIMULATION AND VALIDATION OF THE PELTIER PULSE MARKING OF SOLID LIQUID INTERFACES/, Journal of crystal growth, 180(3-4), 1997, pp. 604-614
Citations number
24
Categorie Soggetti
Crystallography
Journal title
ISSN journal
00220248
Volume
180
Issue
3-4
Year of publication
1997
Pages
604 - 614
Database
ISI
SICI code
0022-0248(1997)180:3-4<604:NAVOTP>2.0.ZU;2-D
Abstract
We describe a numerical approach of the solidification of binary alloy s to study the motion of a crystal/melt interface submitted to current pulses involving a modification of the dopant concentration field. Fo r the thermal aspect, the Thomson effect, the Peltier effect and Joule heating have been included in the heat flow. For the solutal segregat ion, our model is based on mass transports which occur in the liquid p hase, namely diffusion and convection. Numerical computations are vali dated by comparison with experimental data and thus could find applica tions in the prediction of the effects of Peltier pulse marking in cry stal growth.