NANOSCALE ETCHING OF GAAS-SURFACES IN ELECTROLYTIC SOLUTIONS BY HOLE INJECTION FROM A SCANNING TUNNELING MICROSCOPE TIP

Citation
C. Kaneshiro et T. Okumura, NANOSCALE ETCHING OF GAAS-SURFACES IN ELECTROLYTIC SOLUTIONS BY HOLE INJECTION FROM A SCANNING TUNNELING MICROSCOPE TIP, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 15(5), 1997, pp. 1595-1598
Citations number
13
Categorie Soggetti
Physics, Applied
ISSN journal
10711023
Volume
15
Issue
5
Year of publication
1997
Pages
1595 - 1598
Database
ISI
SICI code
1071-1023(1997)15:5<1595:NEOGIE>2.0.ZU;2-8
Abstract
Controllable etching of GaAs(100) has been electrochemically achieved on a nanometer scale by using a scanning tunneling microscope (STM) in acidic solutions (pH=2-3). The realized features on n-GaAs(100) surfa ce were as small as 10 nm. We studied the dependence of the etching ra te on the potentials applied to the STM tip as well as the GaAs substr ate. These results indicate that the hole injection from the tip is re sponsible for the local etching of GaAs surfaces in electrolytes rathe r than local charges induced by an electric field. (C) 1997 American V acuum Society. [S0734-211X(97)04205-4].