NANOLITHOGRAPHY BY DISPLACEMENT OF CATALYTIC METAL-CLUSTERS USING AN ATOMIC-FORCE MICROSCOPE TIP

The use of catalytically active nanoclusters as a novel material for a tomic force microscope (AFM) nanolithography is demonstrated. Films we re prepared from colloidal Au nanoparticles and giant Pd clusters. Lit hographic patterns were generated using the contact area of the AFM ti p to physically displace nanoclusters, forming two-dimensional pattern s on silicon oxide and functionalized silicon surfaces. Linewidth was found to depend on the force applied to the nanoparticles and the numb er of tip passes used to generate the pattern. Conditions were optimiz ed to clear scanned areas using minimum applied force. Patterned films were used as templates for the selective deposition of electroless me tal, which served as a robust plasma etch mask for pattern transfer in to the underlying substrate to a depth of 200 nm. Minimum linewidths o f approximately 35 nm were achieved in etched samples. (C) 1997 Americ an Vacuum Society. [S0734-211X(97)00105-4].