AN APPROACH TO LAYOUT AND PROCESS VERIFICATION FOR MICROSYSTEM PHYSICAL DESIGN

Authors
Citation
K. Hahn et R. Bruck, AN APPROACH TO LAYOUT AND PROCESS VERIFICATION FOR MICROSYSTEM PHYSICAL DESIGN, Microsystem technologies, 3(2), 1997, pp. 53-60
Citations number
10
Categorie Soggetti
Engineering, Eletrical & Electronic","Instument & Instrumentation
Journal title
ISSN journal
09467076
Volume
3
Issue
2
Year of publication
1997
Pages
53 - 60
Database
ISI
SICI code
0946-7076(1997)3:2<53:AATLAP>2.0.ZU;2-Q
Abstract
The physical phases of microsystem design are concerned with generatin g all data needed to fabricate microstructures. As lithography-based t echnologies are used to fabricate MEMS, this includes the design of tw o-dimensional mask layouts as well as the design of process step seque nces and parameters which determine the object extensions in the third dimension. LIDO is a MEMS physical design system that supports this c oncurrent design strategy by providing tools to easily configure appro priate process sequences, to derive consistent sets of geometric layou t design rules from them and to use these design rules to verify mask layouts.