The physical phases of microsystem design are concerned with generatin
g all data needed to fabricate microstructures. As lithography-based t
echnologies are used to fabricate MEMS, this includes the design of tw
o-dimensional mask layouts as well as the design of process step seque
nces and parameters which determine the object extensions in the third
dimension. LIDO is a MEMS physical design system that supports this c
oncurrent design strategy by providing tools to easily configure appro
priate process sequences, to derive consistent sets of geometric layou
t design rules from them and to use these design rules to verify mask
layouts.