Interference of purely inelastically scattered electrons in the Gaussi
an image plane of an energy-filtering TEM (EFTEM) provides a means to
measure the localisation of a specific inelastic scattering process, A
lthough, the initial degree of angular coherence given by the illumina
tion angle of the electron source is reduced by the inelastic scatteri
ng event, interference of single plasmon scattered electrons was obser
ved in a Zeiss EM 912 OMEGA. The lower limit of the localisation of si
ngle plasmon scattering in an aluminium single crystal was measured in
this experiment to be 16 nm. Present experimental restrictions are th
e limited degree of coherence of the LaB6 electron source and the fixe
d position of the Mollenstedt-biprism along the beam of the Zeiss EM 9
12 OMEGA electron microscope.