Ferroelectric non-volatile memories (FENVM) are fabricated using spin-
coat and fire deposition of the SrBi2Ta2O9 layered perovskite ferroele
ctric. Test memories using a 2 transistor-2 capacitor bit cell, top co
ntacts to capacitors and single level metal were fabricated. We report
here on the integration and electrical characteristics of fully funct
ional 1 Kbit test memories.