A STUDY OF SPUTTERED BARIUM STRONTIUM-TITANATE AND STRONTIUM-TITANATETHIN-FILMS

Citation
Ba. Baumert et al., A STUDY OF SPUTTERED BARIUM STRONTIUM-TITANATE AND STRONTIUM-TITANATETHIN-FILMS, Integrated ferroelectrics, 17(1-4), 1997, pp. 165-178
Citations number
21
Categorie Soggetti
Physics, Condensed Matter","Engineering, Eletrical & Electronic","Physics, Applied
Journal title
ISSN journal
10584587
Volume
17
Issue
1-4
Year of publication
1997
Pages
165 - 178
Database
ISI
SICI code
1058-4587(1997)17:1-4<165:ASOSBS>2.0.ZU;2-3
Abstract
Sputtered Ba1-xSrxTiO3 (BST) and SrTiO3 (STO) films and capacitors mad e with these dielectrics have been characterized with respect to physi cal and electrical properties. Specific capacitance values included a high of 120 fF/mu m(2) for BST films deposited at 600 degrees C and a high of 27 fF/mu m(2) for STO films deposited at 450 degrees C. Leakag e current densities at 3.3 V for the most part varied from mid 10(-8) to mid 10(-6) amps/cm(2). All of the dielectrics are polycrystalline, although the lowest temperature STO films have a nearly amorphous laye r which impacts their Grain size increases with deposition temperature , which correlates to higher dielectric constants. The lattice paramet er of the BST films is larger than that of bulk samples. Capacitance, leakage, breakdown, and lifetime results are reported.