LOW-ENERGY ION-BEAM-ASSISTED GRAIN-SIZE EVOLUTION IN THIN-FILM DEPOSITION

In this paper, we demonstrate the value of applying new microstructura l metrics in the characterization of grain size variations associated with the effects of very low energy ion beam assisted deposition of ni ckel thin films. It is shown that the apparent changes in grain size a re associated with specific texture components. It is suggested that t hese descriptions of grain growth during deposition may provide more m eaningful interpretations of the atomistic level mechanisms influencin g grain size changes associated with very low energy ion beam depositi on of thin films.