ULTRAHIGH-VACUUM DEPOSITION REFLECTOMETER SYSTEM FOR THE IN-SITU INVESTIGATION OF Y MO EXTREME-ULTRAVIOLET MULTILAYER MIRRORS/

Authors
MONTCALM C SULLIVAN BT RANGER M PEPIN H
Citation
C. Montcalm et al., ULTRAHIGH-VACUUM DEPOSITION REFLECTOMETER SYSTEM FOR THE IN-SITU INVESTIGATION OF Y MO EXTREME-ULTRAVIOLET MULTILAYER MIRRORS/, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 15(6), 1997, pp. 3069-3081
Citations number
29
Categorie Soggetti
Physics, Applied","Materials Science, Coatings & Films
Journal title
Journal of vacuum science & technology. A. Vacuum, surfaces, and films → ACNP
ISSN journal
07342101
Volume
15
Issue
6
Year of publication
1997
Pages
3069 - 3081
Database
ISI
SICI code
0734-2101(1997)15:6<3069:UDRSFT>2.0.ZU;2-7
Abstract
An ultrahigh vacuum deposition-reflectometer system was constructed to allow the deposition and subsequent irt situ reflectance measurement of extreme-ultraviolet multilayer mirrors. In this article various asp ects of the deposition chamber and the reflectance measurement setup a re discussed. To demonstrate the capabilities of this system, Y/Mo mul tilayer mirrors were studied in detail by varying deposition condition s and measuring their subsequent in situ reflectance. By optimizing th e deposition conditions, reflectances of 21.3%, 34.7%, and 46.1% were obtained for the Y/Mo mirrors at wavelengths of 7.9, 9.7, and 11.4 nm, respectively. (C) 1997 American Vacuum Society. [S0734-2101(97)04606- X].