SURFACE KINETIC-STUDY OF ION-INDUCED CHEMICAL-VAPOR-DEPOSITION OF COPPER FOR FOCUSED ION-BEAM APPLICATIONS

A systematic surface kinetic study of ion-induced chemical vapor depos ition (II-CVD) of Cu from Cu(I) hexafluoroacetylacetonate vinyltrimeth ylsilane was performed using quartz crystal microbalance mass depositi on rate measurements, x-ray photoelectron spectroscopy compositional a nalysis, and laser-induced thermal desorption coverage measurements in a multibeam scattering apparatus. With the above, a phenomenological surface kinetic model describing the adsorption, deposition (both of t he desired source metal and of unwanted impurities), byproduct desorpt ion, and sputtering processes involved in II-CVD was formulated. The s urface kinetic modal predicts the deposition rate, composition, and pr ecursor coverage dependencies in agreement with experimental results. (C) 1997 American Vacuum Society. [S0734-2101(97)04506-5].