LOW-TEMPERATURE ECR-CVD OF (BA,SR)TIO3 FILMS

Citation
P. Alluri et al., LOW-TEMPERATURE ECR-CVD OF (BA,SR)TIO3 FILMS, Integrated ferroelectrics, 18(1-4), 1997, pp. 145-154
Citations number
5
Categorie Soggetti
Physics, Condensed Matter","Engineering, Eletrical & Electronic","Physics, Applied
Journal title
ISSN journal
10584587
Volume
18
Issue
1-4
Year of publication
1997
Pages
145 - 154
Database
ISI
SICI code
1058-4587(1997)18:1-4<145:LEO(F>2.0.ZU;2-K
Abstract
This paper reports the deposition of polycrystalline SrTiO3 at 390 deg rees C by using ECR-plasma CVD and direct liquid injection. The format ion of crystalline (Ba,Sr)TiO3 thin films at low temperatures is hinde red by the formation of the BaCO3 phase. To reduce the carbonate phase , it is necessary to use excess oxygen partial pressures at the expens e of the deposition rate. It is also demonstrated that thermodynamic p hase stability diagrams can be used as guidelines for implementing CVD experiments.