STUDY ON ELECTROMAGNETRON FOR PLASMA POLYMERIZATION .2. MAGNETIC-FIELD ENHANCED RADIO-FREQUENCY PLASMA DEPOSITION OF ORGANOGERMANIUM FILMS FROM TETRAETHYLGERMANIUM

Construction of a reactive magnetron rf plasma deposition system with cylindrical electrodes is presented. Design of an individual electrode equipped with integrated multiple electromagnet system together with the characteristics of its magnetic field is described. Properties of magnetron discharge and plasma geometry are also presented. Deposition of organogermanium films from tetraethylgermanium in magnetically enh anced rf plasma is discussed in terms of deposition rates and general properties of the films with the particular attention paid to their de nsity. Both, elemental composition of these films by electron spectros copy for chemical analysis and their chemical functionality by Fourier transform infrared spectroscopy are also given. The main advantage of magnetic field enhancement is local increase of plasma density restri cting the discharge, and consequently deposition, to the desired volum e. Additionally, the application of a system of integrated electromagn ets enables the use of magnetic field intensity as an independent proc ess optimization parameter.