STUDY ON ELECTROMAGNETRON FOR PLASMA POLYMERIZATION .2. MAGNETIC-FIELD ENHANCED RADIO-FREQUENCY PLASMA DEPOSITION OF ORGANOGERMANIUM FILMS FROM TETRAETHYLGERMANIUM
M. Gazicki et al., STUDY ON ELECTROMAGNETRON FOR PLASMA POLYMERIZATION .2. MAGNETIC-FIELD ENHANCED RADIO-FREQUENCY PLASMA DEPOSITION OF ORGANOGERMANIUM FILMS FROM TETRAETHYLGERMANIUM, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 12(2), 1994, pp. 345-353
Citations number
24
Categorie Soggetti
Physics, Applied","Materials Science, Coatings & Films
Construction of a reactive magnetron rf plasma deposition system with
cylindrical electrodes is presented. Design of an individual electrode
equipped with integrated multiple electromagnet system together with
the characteristics of its magnetic field is described. Properties of
magnetron discharge and plasma geometry are also presented. Deposition
of organogermanium films from tetraethylgermanium in magnetically enh
anced rf plasma is discussed in terms of deposition rates and general
properties of the films with the particular attention paid to their de
nsity. Both, elemental composition of these films by electron spectros
copy for chemical analysis and their chemical functionality by Fourier
transform infrared spectroscopy are also given. The main advantage of
magnetic field enhancement is local increase of plasma density restri
cting the discharge, and consequently deposition, to the desired volum
e. Additionally, the application of a system of integrated electromagn
ets enables the use of magnetic field intensity as an independent proc
ess optimization parameter.