STUDY OF TIOXNY THIN-FILM SELECTIVE SURFACES PRODUCED BY ION-ASSISTEDDEPOSITION

Thin films of titanium oxynitride were produced by ion assisted deposi tion of titanium using different nitrogen to oxygen ion ratios. X-ray, Raman, nuclear reaction analysis and Rutherford backscattering spectr oscopies were used to study the film structure and to establish the re lationship between deposition conditions, him composition, and electri cal and optical properties of the films in the visible and infrared. T his method of deposition appears to yield hard, amorphous; and uniform films with a restricted compositional range near the equistoichiometr ic composition. Nevertheless, variations in oxygen content of the film s can result in changes in the electrical and optical properties that are sufficiently large to enable their use as selective surfaces. (C) 1997 American Vacuum Society.