STUDIES OF REACTIVE SPUTTERING OF MULTIPHASE CHROMIUM NITRIDE

We have presented a model for reactive sputter deposition of two-phase materials. This model has been applied to reactive sputtering of chro mium nitride where it is assumed that either Cr2N or CrN is formed. In order to test the validity of the model, a number of deposition exper iments has been performed where the film composition for different rea ctive gas supplies has been estimated by means of in situ soft x-ray e mission spectroscopy. The results have been compared with predicted fi lm compositions according to the model and the experimental findings a gree qualitatively with the simulations. (C) 1997 American Vacuum Soci ety.