L. Huang et al., NEW ASPECTS OF K PROMOTED NITRIDATION OF THE INP(100) SURFACE, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 15(2), 1997, pp. 374-376
Citations number
8
Categorie Soggetti
Physics, Applied","Materials Science, Coatings & Films
The effect of molecular nitrogen exposure on the InP(100) surface modi
fied by the alkali metal K overlayer is investigated by core-level pho
toemission spectroscopy using synchrotron radiation. The alkali metal
covered surface exhibits reasonable nitrogen uptake at room temperatur
e, and results in the formation of a P3N5 nitride complex. Flash annea
ling at 400 degrees C greatly enhanced the formation of this kind of n
itride complex. Above 500 degrees C, the nitride complex dissolved com
pletely. (C) 1997 American Vacuum Society.