Sa. Clark et al., ARSENIC CAPPING AND DECAPPING OF INYAL1-YAS(100) GROWN BY MOLECULAR-BEAM EPITAXY, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 12(2), 1994, pp. 551-554
A study of the surface of InyAl1-yAs, grown lattice matched on InP(100
) by molecular beam epitaxy, protected by an As cap during storage in
air and subsequently annealed in ultrahigh vacuum. is presented. The s
urface structure and stoichiometry of the layers are investigated by l
ow energy electron diffraction and x-ray photoemission spectroscopy. T
hese investigations show that decapping may be achieved by annealing t
he sample at 390-degrees-C to reveal an atomically clean, As-stabilize
d surface, exhibiting a (3 X 1) symmetry. It is also shown that the re
lative population of In and Al on or near the surface is different fro
m that of the underlying bulk InyAl1-yAs layer and that the overall su
rface symmetry and stoichiometry may be further adapted by annealing t
o higher temperatures.