Sm. Malik et al., OVERVIEW OF PLASMA SOURCE ION-IMPLANTATION RESEARCH AT UNIVERSITY-OF-WISCONSIN-MADISON, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 12(2), 1994, pp. 843-849
In the last five years, plasma source ion implantation (PSII) research
at the University of Wisconsin-Madison, has encompassed work in the a
reas of plasma physics, diagnostics, ion-material interactions' modeli
ng, materials science issues, and a broad spectrum of industrial appli
cations of PSII technology. The third generation PSII system is presen
tly under construction. Three methods of plasma generation, namely, el
ectron impact method, glow discharge, and radio frequency have been su
ccessfully employed. In the following article the highlights of the ab
ove facets of PSII research activities have been presented.