OVERVIEW OF PLASMA SOURCE ION-IMPLANTATION RESEARCH AT UNIVERSITY-OF-WISCONSIN-MADISON

In the last five years, plasma source ion implantation (PSII) research at the University of Wisconsin-Madison, has encompassed work in the a reas of plasma physics, diagnostics, ion-material interactions' modeli ng, materials science issues, and a broad spectrum of industrial appli cations of PSII technology. The third generation PSII system is presen tly under construction. Three methods of plasma generation, namely, el ectron impact method, glow discharge, and radio frequency have been su ccessfully employed. In the following article the highlights of the ab ove facets of PSII research activities have been presented.