K. Thomas et al., 2 ION FLUID MODEL FOR PLASMA SOURCE ION-IMPLANTATION, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 12(2), 1994, pp. 901-904
For plasma source ion implantation in a nitrogen discharge, there is a
mixture of atomic and molecular species N+ and N2+, respectively. A t
ime dependent fluid model has been developed, which models a plasma co
nsisting of two species of cold collisionless ion fluids, assuming tha
t the electrons are in thermal equilibrium. Following the application
of a large, negative voltage pulse to the metal target, the density an
d velocity of the two ion species, and the sheath evolution for a rang
e of possible ion mixtures are calculated.