HIGH-QUALITY STRAINED QUANTUM WIRES GROWN BY MOLECULAR-BEAM EPITAXY ON (100) GAAS SUBSTRATE

Citation
Yp. Chen et al., HIGH-QUALITY STRAINED QUANTUM WIRES GROWN BY MOLECULAR-BEAM EPITAXY ON (100) GAAS SUBSTRATE, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 12(2), 1994, pp. 1280-1282
Citations number
18
Categorie Soggetti
Physics, Applied
ISSN journal
10711023
Volume
12
Issue
2
Year of publication
1994
Pages
1280 - 1282
Database
ISI
SICI code
1071-1023(1994)12:2<1280:HSQWGB>2.0.ZU;2-2
Abstract
High-radiative recombination efficiency arrays of InGaAs/GaAs strained quantum wires have been fabricated by a combination of e-beam lithogr aphy, dry and wet etching, sidewall desorption, migration-enhanced epi taxial and molecular beam epitaxial regrowth. The structure was evalua ted by reflection high-energy electron diffraction, cross-sectional tr ansmission electron microscopy, and photoluminescence spectroscopy. Tr ansmission electron microscopy study showed that a defect-free regrown layer and excellent sidewall coverage have been attained. From the ph otoluminescence measurement, the sample showed high-radiative efficien cy, and had strong photoluminescence for wire widths down to 190 nm.