OBSERVATION OF QUANTUM-MECHANICAL REFLECTIONS OF ELECTRONS AT AN IN-SITU GROWN GAAS ALUMINUM SCHOTTKY-BARRIER/

Citation
Mv. Weckwerth et al., OBSERVATION OF QUANTUM-MECHANICAL REFLECTIONS OF ELECTRONS AT AN IN-SITU GROWN GAAS ALUMINUM SCHOTTKY-BARRIER/, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 12(2), 1994, pp. 1303-1305
Citations number
8
Categorie Soggetti
Physics, Applied
ISSN journal
10711023
Volume
12
Issue
2
Year of publication
1994
Pages
1303 - 1305
Database
ISI
SICI code
1071-1023(1994)12:2<1303:OOQROE>2.0.ZU;2-P
Abstract
The room temperature observation of quantum mechanical reflections of electrons at an aluminum/gallium arsenide Schottky barrier is reported here. Molecular-beam epitaxy was used to grow an AlAs/GaAs/AlAs doubl e barrier resonant tunneling diode (RTD) followed by an epitaxial in s itu grown aluminum/gallium arsenide Schottky barrier. This RTD was use d to inject a nearly monoenergetic beam of electrons towards the Schot tky barrier. The measured I-V curves show resonances associated with t he reflections of electrons at the Schottky interface. Understanding t he transport properties of hot electrons at a Schottky barrier may pro ve important for understanding the physics of metal base transistors a nd other device structures that employ the use of epitaxial metals.