T. Nishimori et al., METHANE ADSORPTION AND HYDROGEN ISOTHERMAL DESORPTION-KINETICS ON A C(001)-(1X1) SURFACE, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 13(6), 1995, pp. 2781-2786
Citations number
27
Categorie Soggetti
Physics, Applied","Materials Science, Coatings & Films
Methane (CH4) adsorption and isothermal hydrogen (H-2) desorption kine
tics on a C(001)-(1x1) surface have been investigated by observing the
surface hydrogen coverage theta(H) which is estimated from the electr
on-stimulated desorption yield of H+ ions. The time evolution of theta
H under CH4 exposure, in pressure and temperature ranges of 1X10(-8)-
5x10(-7) Torr and 600-800 degrees C, reveals that the CH4 adsorption i
s a first-order reaction. The isothermal H-2 desorption is conducted i
n a temperature range of 1095-1270 degrees C. The time evolution of th
eta(H) shows that the isothermal H-2 desorption is also a first-order
reaction. From Arrhenius plots of the reaction coefficients, the activ
ation energies of CH4 adsorption and H-2 desorption are evaluated to b
e 7.3+/1.7 and 21+/-4.9 kcal/mol, respectively. Atomistic kinetics mod
el for CH4 adsorption and H-2 desorption are discussed, especially in
connection with a recent finding of gas source molecular beam epitaxy
of diamond (001) with pure CH4 without any hydrogen or oxygen radicals
. (C) 1995 American Vacuum Society.