ORGANIC VAPOR-PHASE DEPOSITION - A NEW METHOD FOR THE GROWTH OF ORGANIC THIN-FILMS WITH LARGE OPTICAL NONLINEARITIES

Citation
Pe. Burrows et al., ORGANIC VAPOR-PHASE DEPOSITION - A NEW METHOD FOR THE GROWTH OF ORGANIC THIN-FILMS WITH LARGE OPTICAL NONLINEARITIES, Journal of crystal growth, 156(1-2), 1995, pp. 91-98
Citations number
12
Categorie Soggetti
Crystallography
Journal title
ISSN journal
00220248
Volume
156
Issue
1-2
Year of publication
1995
Pages
91 - 98
Database
ISI
SICI code
0022-0248(1995)156:1-2<91:OVD-AN>2.0.ZU;2-7
Abstract
We describe a novel technique, organic vapor phase deposition, for the growth of thin films of optically non-linear organic salts. A volatil e precursor of each component of the salt is carried as a vapor to a h ot-wall reaction chamber by independently controlled streams of carrie r gas. The components react to form a polycrystalline thin film on sub strates of glass and gold. Excess reactants and reaction products are purged from the system by the carrier gas. As an example, we demonstra te the growth of polycrystalline, optically non-linear thin films of 4 '-dimethylamino-N-methyl-4-stilbazolium tosylate (DAST) with > 95% pur ity.