The influence of microstructure on the critical current density of las
er ablated YBa2Cu3O70-delta thin films has been examined. Scanning tun
neling microscopy was used to examine the morphologies of YBa2Cu3O7-de
lta films and the morphology data were then correlated with measuremen
ts of the critical current density. The films were found to grow by an
island nucleation and growth mechanism. The critical current densitie
s of the films are similar to those of films with screw dislocation gr
owth, indicating that screw dislocation growth is not necessary for go
od pinning. The data suggest that the critical current density in appl
ied magnetic field may be higher in films with higher densities of gro
wth features.