HIGH-TEMPERATURE DC CHARACTERISTICS OF ALXGA0.52-XIN0.48P GAAS HETEROJUNCTION BIPOLAR-TRANSISTORS GROWN BY METAL-ORGANIC VAPOR-PHASE EPITAXY/

Citation
Hk. Yow et al., HIGH-TEMPERATURE DC CHARACTERISTICS OF ALXGA0.52-XIN0.48P GAAS HETEROJUNCTION BIPOLAR-TRANSISTORS GROWN BY METAL-ORGANIC VAPOR-PHASE EPITAXY/, I.E.E.E. transactions on electron devices, 43(1), 1996, pp. 2-7
Citations number
14
Categorie Soggetti
Engineering, Eletrical & Electronic","Physics, Applied
ISSN journal
00189383
Volume
43
Issue
1
Year of publication
1996
Pages
2 - 7
Database
ISI
SICI code
0018-9383(1996)43:1<2:HDCOAG>2.0.ZU;2-8
Abstract
A series of AlxGa0.52-xIn0.48 P/GaAs heterojunction bipolar transistor s (HBT's) with x = 0 to x = 0.52 showed ideality factors close to unit y for both base current and collector current and small variation in g ain with temperature up to at least T = 623 K across the whole range o f a composition, Hole current injection from the base into the emitter in these devices was shown to be negligible, The current gain, beta, which is temperature insensitive was thought to be limited by bulk bas e recombination for x less than or equal to 0.3 and recombination at t he graded emitter region for x > 0.3. The optimum emitter composition (highest beta, and good beta stability with collector current and temp erature) was found to be x = 0.18-0.30, Useful transistor action with very high gain and output resistance is possible up to at least T = 62 3 K, limited only by the thermal performance of the unoptimized ohmic contacts employed in the devices.