ROOM-TEMPERATURE LUMINESCENCE FROM SI GE SINGLE-QUANTUM-WELL DIODES GROWN BY MOLECULAR-BEAM EPITAXY/

Citation
H. Presting et al., ROOM-TEMPERATURE LUMINESCENCE FROM SI GE SINGLE-QUANTUM-WELL DIODES GROWN BY MOLECULAR-BEAM EPITAXY/, Journal of crystal growth, 157(1-4), 1995, pp. 15-20
Citations number
18
Categorie Soggetti
Crystallography
Journal title
ISSN journal
00220248
Volume
157
Issue
1-4
Year of publication
1995
Pages
15 - 20
Database
ISI
SICI code
0022-0248(1995)157:1-4<15:RLFSGS>2.0.ZU;2-9
Abstract
Room-temperature electroluminescence (EL) in the near infrared (lambda approximate to 1.3 mu m) has been observed from Ge/Si/Ge/Si1-xGex qua ntum well (QW) diodes grown by molecular beam epitaxy (MBE). The QWs a re grown on a p(+)-doped [100]-Si substrates and consist of two thin G e wells separated by a thicker Si middle layer. The whole structure is embedded in Si0.85Ge0.15 alloy layers situated on both sides. The str ucture was designed by pseudopotential calculations with a view to ens uring stability of the interband luminescence up to room temperature. The observed spectra are in good agreement with our theoretical predic tions.