HIGH-SPEED SIGE HETEROBIPOLAR TRANSISTORS

Citation
A. Schuppen et H. Dietrich, HIGH-SPEED SIGE HETEROBIPOLAR TRANSISTORS, Journal of crystal growth, 157(1-4), 1995, pp. 207-214
Citations number
23
Categorie Soggetti
Crystallography
Journal title
ISSN journal
00220248
Volume
157
Issue
1-4
Year of publication
1995
Pages
207 - 214
Database
ISI
SICI code
0022-0248(1995)157:1-4<207:HSHT>2.0.ZU;2-1
Abstract
SiGe heterobipolar transistors are near the point of commercial availa bility. They will be inserted in mobile phones in the 0.9 to 2.4 GHz r ange and in wireless local area networks using the 2.4 to 5.8 GHz band . The advantage of SiGe HBTs is not only their excellent high frequenc y and noise performance with a maximum frequency of oscillation up to 120 GHz and 0.9 dB noise figure at 10 GHz, but the compatibility of Si Ge to standard silicon technology. Fabrication processes and results o f a research-like SiGe HBT and a possible production type HBT version are described. In addition, some circuit demonstrators for SiGe ICs wi ll be presented.