PHOTOINDUCED INTERSUBBAND ABSORPTION IN SI SIGE QUANTUM-WELLS/

Citation
P. Boucaud et al., PHOTOINDUCED INTERSUBBAND ABSORPTION IN SI SIGE QUANTUM-WELLS/, Journal of crystal growth, 157(1-4), 1995, pp. 227-230
Citations number
12
Categorie Soggetti
Crystallography
Journal title
ISSN journal
00220248
Volume
157
Issue
1-4
Year of publication
1995
Pages
227 - 230
Database
ISI
SICI code
0022-0248(1995)157:1-4<227:PIAISS>2.0.ZU;2-J
Abstract
We have investigated photo-induced intersubband absorption in the vale nce band of Si/SiGe quantum wells. Carriers are optically generated in the quantum wells using an argon ion laser. The resulting infrared ab sorption is probed with a step-scan Fourier transform infrared spectro meter. The photo-induced infrared absorption in SiGe quantum wells is dominated by two contributions: the free carrier absorption, which is similar to bulk absorption in a uniformly doped SiGe layer, and the va lence subband absorption in the quantum wells. Both p- and s-polarized intersubband absorptions are measured. We have observed that the phot o-induced intersubband absorption in doped samples is shifted to lower energy as compared to direct intersubband absorption. This absorption process is attributed to carriers away from the Brillouin zone center . We show that the photo-induced technique is appropriate to study val ence band mixing effects and their influence on intersubband absorptio n.