OPTICAL AND ELECTRONIC-PROPERTIES OF SIGEC ALLOYS GROWN ON SI SUBSTRATE

Citation
J. Kolodzey et al., OPTICAL AND ELECTRONIC-PROPERTIES OF SIGEC ALLOYS GROWN ON SI SUBSTRATE, Journal of crystal growth, 157(1-4), 1995, pp. 386-391
Citations number
19
Categorie Soggetti
Crystallography
Journal title
ISSN journal
00220248
Volume
157
Issue
1-4
Year of publication
1995
Pages
386 - 391
Database
ISI
SICI code
0022-0248(1995)157:1-4<386:OAEOSA>2.0.ZU;2-L
Abstract
Metastable Si1-x-yGexCy alloys were grown by molecular beam epitaxy on (100) Si substrates. Solid elemental sources were used for the Si and Ge beams, and a resistively heated graphite filament was used for the C beam. Up to 3 at % of C was incorporated in the alloy layers. Optic al transmission measurements showed that the absorption edge of thick layers increased to higher energies with increasing C fraction, and re vealed the presence of Si-C and Ge-C vibrational modes in the infrared . Al low temperatures, the alloys showed significant photoluminescence . The bandgap energies of thick layers increased linearly with the C f raction and followed a linear dependence of the bandgap on composition . Measurements of the valence band density of states using X-ray photo electron spectroscopy indicated that the valence band energy maximum i ncreased with the C fraction relative to that of SiGe alloys of simila r composition. Our results indicated that SiGeC alloys are promising m aterials for Si-based heterostructure devices.