METAL-IN80AL20SB INTERFACE FORMATION - AN X-RAY PHOTOELECTRON-SPECTROSCOPY STUDY

Citation
Sa. Clark et al., METAL-IN80AL20SB INTERFACE FORMATION - AN X-RAY PHOTOELECTRON-SPECTROSCOPY STUDY, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 13(6), 1995, pp. 2289-2292
Citations number
11
Categorie Soggetti
Physics, Applied
ISSN journal
10711023
Volume
13
Issue
6
Year of publication
1995
Pages
2289 - 2292
Database
ISI
SICI code
1071-1023(1995)13:6<2289:MIF-AX>2.0.ZU;2-C
Abstract
The formation of intimate, atomically clean, In-In80Al20Sb interfaces has been investigated using x-ray photoelectron spectroscopy. The atte nuation of the substrate (Sb) core levels showed anomalous behavior; i ncreasing for the first few monolayers of In deposited. This is interp reted in terms of a reaction between chemisorbed In on the c(8X2) reco nstructed In-rich In80Al20Sb surface and deposited In, to produce clus tering, so enhancing the substrate signals emanating from bulk In80Al2 0Sb. The incremental deposition of In brought about incremental shifts of the In core level binding energies, related to changes in the chem ical environment of the In. For the other bulk core levels examined, n o further shifts were resolved, indicating that the Fermi level at the In80Al20Sb surface is pinned prior to metallization. (C) 1995 America n Vacuum Society.