Sa. Clark et al., METAL-IN80AL20SB INTERFACE FORMATION - AN X-RAY PHOTOELECTRON-SPECTROSCOPY STUDY, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 13(6), 1995, pp. 2289-2292
The formation of intimate, atomically clean, In-In80Al20Sb interfaces
has been investigated using x-ray photoelectron spectroscopy. The atte
nuation of the substrate (Sb) core levels showed anomalous behavior; i
ncreasing for the first few monolayers of In deposited. This is interp
reted in terms of a reaction between chemisorbed In on the c(8X2) reco
nstructed In-rich In80Al20Sb surface and deposited In, to produce clus
tering, so enhancing the substrate signals emanating from bulk In80Al2
0Sb. The incremental deposition of In brought about incremental shifts
of the In core level binding energies, related to changes in the chem
ical environment of the In. For the other bulk core levels examined, n
o further shifts were resolved, indicating that the Fermi level at the
In80Al20Sb surface is pinned prior to metallization. (C) 1995 America
n Vacuum Society.