AN ELECTRON-BEAM MICROCOLUMN WITH IMPROVED RESOLUTION, BEAM CURRENT, AND STABILITY

Citation
E. Kratschmer et al., AN ELECTRON-BEAM MICROCOLUMN WITH IMPROVED RESOLUTION, BEAM CURRENT, AND STABILITY, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 13(6), 1995, pp. 2498-2503
Citations number
11
Categorie Soggetti
Physics, Applied
ISSN journal
10711023
Volume
13
Issue
6
Year of publication
1995
Pages
2498 - 2503
Database
ISI
SICI code
1071-1023(1995)13:6<2498:AEMWIR>2.0.ZU;2-A
Abstract
We have built and tested a 1 keV electron-beam microcolumn that focuse s 1 nA of beam current into a 10 nm full width half-maximum beam diame ter at a working distance of 1 mm. The electron source is a miniaturiz ed Zr/O/W Schottky field emitter with 150 mu A/sr angular emission cur rent density operating at about 1800 K at a distance of only 100 mu m from a silicon membrane extractor electrode, The actual microcolumn is 3.5 mm long assembled mainly from silicon membrane electrodes. Improv ed einzel lens design and fabrication allowed the operation of this be am focusing element in the accelerating mode. Spherical and chromatic aberrations were reduced by factors of about 2-3, respectively, as com pared to he retarding lens mode. Excellent beam current stability with less than 1% variation over several hours has been observed. (C) 1995 American Vacuum Society.