ELECTRON-BEAM LITHOGRAPHY DIGITAL PATTERN GENERATOR AND ELECTRONICS FOR GENERALIZED CURVILINEAR STRUCTURES

Citation
Eh. Anderson et al., ELECTRON-BEAM LITHOGRAPHY DIGITAL PATTERN GENERATOR AND ELECTRONICS FOR GENERALIZED CURVILINEAR STRUCTURES, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 13(6), 1995, pp. 2529-2534
Citations number
4
Categorie Soggetti
Physics, Applied
ISSN journal
10711023
Volume
13
Issue
6
Year of publication
1995
Pages
2529 - 2534
Database
ISI
SICI code
1071-1023(1995)13:6<2529:ELDPGA>2.0.ZU;2-D
Abstract
A vector scan pattern generator, optimized for smooth curvilinear as w ell as rectilinear primitive shapes, has been designed and constructed . The pattern generator uses high-speed hardware to implement a set of second-order, quadratic equations to drive digital to analog converte rs and high-speed array processors to calculate the coefficients for t hese equations. The digital pattern generator package contains the hig h-speed digital, analog, and high-resolution analog electronics. The i nitial lithography results confirm the operation of the system and ste pping rates of 40 MHz have been achieved. (C) 1995 American Vacuum Soc iety.