Eh. Anderson et al., ELECTRON-BEAM LITHOGRAPHY DIGITAL PATTERN GENERATOR AND ELECTRONICS FOR GENERALIZED CURVILINEAR STRUCTURES, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 13(6), 1995, pp. 2529-2534
A vector scan pattern generator, optimized for smooth curvilinear as w
ell as rectilinear primitive shapes, has been designed and constructed
. The pattern generator uses high-speed hardware to implement a set of
second-order, quadratic equations to drive digital to analog converte
rs and high-speed array processors to calculate the coefficients for t
hese equations. The digital pattern generator package contains the hig
h-speed digital, analog, and high-resolution analog electronics. The i
nitial lithography results confirm the operation of the system and ste
pping rates of 40 MHz have been achieved. (C) 1995 American Vacuum Soc
iety.