MULTICUSP SOURCES FOR ION-BEAM LITHOGRAPHY APPLICATIONS

Authors
LEUNG KN HERZ P KUNKEL WB LEE Y PERKINS L PICKARD D SARSTEDT M WEBER M WILLIAMS MD
Citation
Kn. Leung et al., MULTICUSP SOURCES FOR ION-BEAM LITHOGRAPHY APPLICATIONS, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 13(6), 1995, pp. 2600-2602
Citations number
7
Categorie Soggetti
Physics, Applied
Journal title
Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena → ACNP
ISSN journal
10711023
Volume
13
Issue
6
Year of publication
1995
Pages
2600 - 2602
Database
ISI
SICI code
1071-1023(1995)13:6<2600:MSFILA>2.0.ZU;2-C
Abstract
Application of the multicusp source for ion projection lithography is described. It is shown that the Longitudinal energy spread of the posi tive ions at the extraction aperture can be reduced by employing a mag netic filter. The advantages of using volume-produced H- ions for ion beam lithography are also discussed. (C) 1995 American Vacuum Society.