ACHROMATIC INTERFEROMETRIC LITHOGRAPHY FOR 100-NM-PERIOD GRATINGS ANDGRIDS

Authors
SAVAS TA SHAH SN SCHATTENBURG ML CARTER JM SMITH HI
Citation
Ta. Savas et al., ACHROMATIC INTERFEROMETRIC LITHOGRAPHY FOR 100-NM-PERIOD GRATINGS ANDGRIDS, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 13(6), 1995, pp. 2732-2735
Citations number
16
Categorie Soggetti
Physics, Applied
Journal title
Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena → ACNP
ISSN journal
10711023
Volume
13
Issue
6
Year of publication
1995
Pages
2732 - 2735
Database
ISI
SICI code
1071-1023(1995)13:6<2732:AILF1G>2.0.ZU;2-A
Abstract
For the fabrication of periodic structures with spatial periods of 100 nm or less. achromatic interferometric lithography is preferred over other lithographic techniques. We report on processes we have develope d, using achromatic interferometric lithography, to fabricate large-ar ea coherent gratings and grids with spatial periods of 100 nm. (C) 199 5 American Vacuum Society.