Aa. Krasnoperova et al., A NOVEL TECHNIQUE FOR HIGH-ASPECT-RATIO HIGH-RESOLUTION PATTERNING OFMEMBRANES, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 13(6), 1995, pp. 3061-3065
This article presents a new technique for fabrication of high aspect r
atio metal patterns on membranes. Two modifications of x-ray lithograp
hic techniques have been employed: simultaneous exposure of a photores
ist coated on both sides of the membrane, and membrane exposure from b
ack side using a negative tone photoresist. Both methods provide self-
aligned masks for pattern transfer into multiple metal layers. Those t
echniques have been used for fabrication of high aspect ratio Fresnel
zone plates for hard x-ray microscopy. 0.15 mu m design rule Fresnel z
one plates, with gold structure of 1.6 mu m thickness have been fabric
ated. (C) 1995 American Vacuum Society.