A NOVEL TECHNIQUE FOR HIGH-ASPECT-RATIO HIGH-RESOLUTION PATTERNING OFMEMBRANES

Citation
Aa. Krasnoperova et al., A NOVEL TECHNIQUE FOR HIGH-ASPECT-RATIO HIGH-RESOLUTION PATTERNING OFMEMBRANES, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 13(6), 1995, pp. 3061-3065
Citations number
11
Categorie Soggetti
Physics, Applied
ISSN journal
10711023
Volume
13
Issue
6
Year of publication
1995
Pages
3061 - 3065
Database
ISI
SICI code
1071-1023(1995)13:6<3061:ANTFHH>2.0.ZU;2-1
Abstract
This article presents a new technique for fabrication of high aspect r atio metal patterns on membranes. Two modifications of x-ray lithograp hic techniques have been employed: simultaneous exposure of a photores ist coated on both sides of the membrane, and membrane exposure from b ack side using a negative tone photoresist. Both methods provide self- aligned masks for pattern transfer into multiple metal layers. Those t echniques have been used for fabrication of high aspect ratio Fresnel zone plates for hard x-ray microscopy. 0.15 mu m design rule Fresnel z one plates, with gold structure of 1.6 mu m thickness have been fabric ated. (C) 1995 American Vacuum Society.