A NOVEL TECHNIQUE FOR HIGH-ASPECT-RATIO HIGH-RESOLUTION PATTERNING OFMEMBRANES

This article presents a new technique for fabrication of high aspect r atio metal patterns on membranes. Two modifications of x-ray lithograp hic techniques have been employed: simultaneous exposure of a photores ist coated on both sides of the membrane, and membrane exposure from b ack side using a negative tone photoresist. Both methods provide self- aligned masks for pattern transfer into multiple metal layers. Those t echniques have been used for fabrication of high aspect ratio Fresnel zone plates for hard x-ray microscopy. 0.15 mu m design rule Fresnel z one plates, with gold structure of 1.6 mu m thickness have been fabric ated. (C) 1995 American Vacuum Society.