EFFECT OF REMAINING SOLVENT ON SENSITIVITY, DIFFUSION OF ACID, AND RESOLUTION IN CHEMICAL AMPLIFICATION RESISTS

Authors
ASAKAWA K USHIROGOUCHI T NAKASE M
Citation
K. Asakawa et al., EFFECT OF REMAINING SOLVENT ON SENSITIVITY, DIFFUSION OF ACID, AND RESOLUTION IN CHEMICAL AMPLIFICATION RESISTS, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 13(3), 1995, pp. 833-839
Citations number
13
Journal title
Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena → ACNP
ISSN journal
10711023
Volume
13
Issue
3
Year of publication
1995
Pages
833 - 839
Database
ISI
SICI code
1071-1023(1995)13:3<833:EORSOS>2.0.ZU;2-Q