ADSORPTION AND DECOMPOSITION OF DIETHYLDIETHOXYSILANE ON SILICON SURFACES - NEW POSSIBILITIES FOR SIO2 DEPOSITION

Authors
WISE ML SNEH O OKADA LA GEORGE SM
Citation
Ml. Wise et al., ADSORPTION AND DECOMPOSITION OF DIETHYLDIETHOXYSILANE ON SILICON SURFACES - NEW POSSIBILITIES FOR SIO2 DEPOSITION, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 13(3), 1995, pp. 865-875
Citations number
41
Journal title
Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena → ACNP
ISSN journal
10711023
Volume
13
Issue
3
Year of publication
1995
Pages
865 - 875
Database
ISI
SICI code
1071-1023(1995)13:3<865:AADODO>2.0.ZU;2-#