X-RAY TRIPLE-CRYSTAL DIFFRACTOMETRY AND TRANSMISSION ELECTRON-MICROSCOPY CHARACTERIZATION OF DEFECTS IN LATTICE-MISMATCHED EPITAXIAL STRUCTURES

Citation
Rn. Kyutt et al., X-RAY TRIPLE-CRYSTAL DIFFRACTOMETRY AND TRANSMISSION ELECTRON-MICROSCOPY CHARACTERIZATION OF DEFECTS IN LATTICE-MISMATCHED EPITAXIAL STRUCTURES, Journal of applied crystallography, 28, 1995, pp. 700-706
Citations number
17
Categorie Soggetti
Crystallography
ISSN journal
00218898
Volume
28
Year of publication
1995
Part
6
Pages
700 - 706
Database
ISI
SICI code
0021-8898(1995)28:<700:XTDATE>2.0.ZU;2-F
Abstract
X-ray triple-crystal diffractometry has been applied to heterostructur es with a misfit of lattice parameters in the interfaces. Si1-xGex/Si compositions as well as GaSb layers strongly mismatched to GaAs substr ates have been studied. By use of various scans in both the Bragg and Laue geometries, the data are presented either as two-dimensional maps in the scattering plane or as the intensity distribution along the di ffraction vector. The structural parameters of the layers were determi ned from a detailed analysis of the diffraction patterns. The X-ray di ffractometry results are supported by a transmission electron microsco py study.