Re. Jones et al., MEMORY APPLICATIONS BASED ON FERROELECTRIC AND HIGH-PERMITTIVITY DIELECTRIC THIN-FILMS, Microelectronic engineering, 29(1-4), 1995, pp. 3-10
Several metal oxide perovskites and Bi layered perovskites are of subs
tantial interest for integrated circuit memories. Strontium titanate,
barium strontium titanate, and lead zirconate titanate based paraelect
rics are of particular interest for dynamic memory applications since
they have high charge storage densities, low leakage currents, and res
istance against time dependent dielectric breakdown sufficient to achi
eve gigabit densities and beyond. The high remanent polarization of fe
rroelectric lead zirconate titanate and strontium bismuth tantalate ho
ld out the promise of low-voltage, high-speed, non-volatile memories.
Advances are being made in the reliability of ferroelectric memories.