DEPOSITION OF PBTIO3 THIN-FILMS FROM THD-COMPLEXES BY AN AEROSOL SOURCE MOCVD METHOD

Authors
KORSAKOV IE KAUL AR KLIPPE L KORN J KRAUSE U PULVER M WAHL G
Citation
Ie. Korsakov et al., DEPOSITION OF PBTIO3 THIN-FILMS FROM THD-COMPLEXES BY AN AEROSOL SOURCE MOCVD METHOD, Microelectronic engineering, 29(1-4), 1995, pp. 205-208
Citations number
5
Categorie Soggetti
Optics,"Physics, Applied","Engineering, Eletrical & Electronic
Journal title
Microelectronic engineering → ACNP
ISSN journal
01679317
Volume
29
Issue
1-4
Year of publication
1995
Pages
205 - 208
Database
ISI
SICI code
0167-9317(1995)29:1-4<205:DOPTFT>2.0.ZU;2-R
Abstract
Evaporation rates of lead, titanium, zirconium and lanthanum thd-precu rsors and deposition rates of corresponding single oxides were measure d by using a microbalance setup. Epitaxial-like PbTiO3 thin films on M gO (100) substrates and heterostructures PbTiO3/In2O3/MgO (100) were d eposited by an aerosol source CVD technique.