ELLIPSOMETRIC DETERMINATION OF THE THICKNESS AND REFRACTIVE-INDEX OF SILICON FILMS

Authors
LI M YAKOVLEV VA WALL J IRENE EA
Citation
M. Li et al., ELLIPSOMETRIC DETERMINATION OF THE THICKNESS AND REFRACTIVE-INDEX OF SILICON FILMS, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 11(6), 1993, pp. 2102-2106
Citations number
17
Categorie Soggetti
Physics, Applied
Journal title
Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena → ACNP
ISSN journal
10711023
Volume
11
Issue
6
Year of publication
1993
Pages
2102 - 2106
Database
ISI
SICI code
1071-1023(1993)11:6<2102:EDOTTA>2.0.ZU;2-Q
Abstract
An ellipsometric method is demonstrated to measure film thickness and the complex index of refraction for Si films using infrared and visibl e light single wavelength ellipsometry. Errors are considered and opti cal models are recommended for different wavelength ranges using resul ts from spectroscopic ellipsometry and atomic force microscopy.