LITHOGRAPHIC PATTERNING OF SELF-ASSEMBLED FILMS

This article discusses a new, general approach for fabricating surface s with precise positional control of chemical functionalities utilizin g direct patterning of self-assembled (SA) organosilane monolayer film s with lithographic exposure tools, including deep ultraviolet, x-ray, and e-beam sources. Lithographically patterned one- and two-component SA films have been used to selectively deposit or attach a wide varie ty of materials to surfaces, including catalysts, electroless metal fi lms, proteins, cells, and organic moieties. Selectively metallized, pa tterned SA films have been employed to fabricate functioning Si metal- oxide-semiconductor field effect transistor test structures. The utili ty of patterned SA films for microelectronics, sensors, and other appl ications is discussed.