Im. Templeton et al., FOCUSED-ION-BEAM DAMAGE-ETCH PATTERNING FOR ISOLATION OF QUANTUM STRUCTURES IN ALGAAS GAAS/, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 11(6), 1993, pp. 2416-2419
A damage-nucleated wet crystallographic etch technique has been develo
ped for AlGaAs. The etch extends beyond the initial patterned region,
and is thus able to remove peripheral damage. GaAs is not appreciably
affected at the dose required, and hence a GaAs layer may be used as a
n etch stop. The technique is readily applicable to the generation of
quantum wires and dots. Photoluminescence studies of several prelimina
ry dot structures in quantum well material show signals whose strength
varies with dot size and with dose.