FOCUSED-ION-BEAM DAMAGE-ETCH PATTERNING FOR ISOLATION OF QUANTUM STRUCTURES IN ALGAAS GAAS/

Citation
Im. Templeton et al., FOCUSED-ION-BEAM DAMAGE-ETCH PATTERNING FOR ISOLATION OF QUANTUM STRUCTURES IN ALGAAS GAAS/, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 11(6), 1993, pp. 2416-2419
Citations number
8
Categorie Soggetti
Physics, Applied
ISSN journal
10711023
Volume
11
Issue
6
Year of publication
1993
Pages
2416 - 2419
Database
ISI
SICI code
1071-1023(1993)11:6<2416:FDPFIO>2.0.ZU;2-P
Abstract
A damage-nucleated wet crystallographic etch technique has been develo ped for AlGaAs. The etch extends beyond the initial patterned region, and is thus able to remove peripheral damage. GaAs is not appreciably affected at the dose required, and hence a GaAs layer may be used as a n etch stop. The technique is readily applicable to the generation of quantum wires and dots. Photoluminescence studies of several prelimina ry dot structures in quantum well material show signals whose strength varies with dot size and with dose.