OPTIMIZATION OF AERIAL IMAGE QUALITY

Authors
TURNER S CERRINA F
Citation
S. Turner et F. Cerrina, OPTIMIZATION OF AERIAL IMAGE QUALITY, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 11(6), 1993, pp. 2446-2451
Citations number
22
Categorie Soggetti
Physics, Applied
Journal title
Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena → ACNP
ISSN journal
10711023
Volume
11
Issue
6
Year of publication
1993
Pages
2446 - 2451
Database
ISI
SICI code
1071-1023(1993)11:6<2446:OOAIQ>2.0.ZU;2-M
Abstract
In this study, a metric of aerial image quality for two dimensional im ages is presented. Modeling is used to predict feature shape. The metr ic then imposes 'bounds of acceptable deviation' on the feature perime ter, and measures the exposure latitude which these bounds allow. The figure of merit is applied to the optimization of mask parameters for x-ray lithography of a 0.25 mum contact hole. The findings of this tri al are presented.