FABRICATION OF HARD X-RAY PHASE ZONE-PLATE BY X-RAY-LITHOGRAPHY

Authors
KRASNOPEROVA AA XIAO J CERRINA F DIFABRIZIO E LUCIANI L FIGLIOMENI M GENTILI M
Citation
Aa. Krasnoperova et al., FABRICATION OF HARD X-RAY PHASE ZONE-PLATE BY X-RAY-LITHOGRAPHY, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 11(6), 1993, pp. 2588-2591
Citations number
14
Categorie Soggetti
Physics, Applied
Journal title
Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena → ACNP
ISSN journal
10711023
Volume
11
Issue
6
Year of publication
1993
Pages
2588 - 2591
Database
ISI
SICI code
1071-1023(1993)11:6<2588:FOHXPZ>2.0.ZU;2-U
Abstract
Fresnel phase zone plates for hard x-ray microfocusing have been fabri cated. An original x-ray mask written by e-beam lithography was replic ated into thick PMMA by x-ray proximity printing. The pattern was tran sferred into gold and nickel by electroplating. A smallest linewidth o f 0.25 mum with an aspect ratio of 14 in the metal pattern has been ac hieved. Thickness of fabricated zone plates was dictated by a pi-phase shift requirement for focusing of the x rays at 8 and 20 keV energies .