EDGE LOCATION ERRORS IN CR-LESS AND RIM-TYPE PHASE-SHIFTING LITHOGRAPHY

When weak phase-shifting concepts, like the Cr-less or rim-type scheme , are applied, the images of feature edges are usually shifted by some amount with respect to their nominal position on the mask. This effec t can be compensated by adding a certain bias to feature edges. This a rticle describes some of the results of an investigation that was perf ormed in order to develop design rules for rim-type and Cr-less phase- shifting masks.