ANALYTICAL EVALUATION OF THE ENERGY DEPOSITION FUNCTION IN ELECTRON-BEAM LITHOGRAPHY IN THE CASE OF A COMPOSITE SUBSTRATE

In this article the energy deposition function in the case of e-beam l ithography is calculated analytically. The distribution of electrons a s a function of depth and energy is calculated first using a method ba sed on the Boltzmann transport equation which is easily applicable in the case of multilayer substrates. Next the lateral distribution of th e electrons is calculated and each contribution (primary, secondary, a nd backscattered electrons) is considered separately. Energy dissipati on results are used as input to a cell removal model for the resist de velopment simulation.