EXPERIMENTAL-STUDY OF AERIAL IMAGES IN X-RAY-LITHOGRAPHY

Authors
GUO JZY LEONARD Q CERRINA F DIFABRIZIO E LUCIANI L GENTILI M FRANK J
Citation
Jzy. Guo et al., EXPERIMENTAL-STUDY OF AERIAL IMAGES IN X-RAY-LITHOGRAPHY, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 11(6), 1993, pp. 2902-2905
Citations number
5
Categorie Soggetti
Physics, Applied
Journal title
Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena → ACNP
ISSN journal
10711023
Volume
11
Issue
6
Year of publication
1993
Pages
2902 - 2905
Database
ISI
SICI code
1071-1023(1993)11:6<2902:EOAIIX>2.0.ZU;2-B
Abstract
Depth-of-focus (gap latitude in proximity lithography) and exposure la titude are the two most important figures-of-merit for linewidth contr ol in lithography. In a recent article, the preliminary result of the experimental verification of this theoretical study was presented-the linewidth variation as a function of gap. In this article, the experim ental results of the exposure latitude are presented and discussed. Ex cellent agreement between experimental and simulation results are foun d. Optimized parameters based on verified model are presented here.