SOFT-X-RAY PRODUCTION FROM LASER-PRODUCED PLASMAS FOR LITHOGRAPHY APPLICATIONS

Authors
SPITZER RC KAUFFMAN RL ORZECHOWSKI T PHILLION DW CERJAN C
Citation
Rc. Spitzer et al., SOFT-X-RAY PRODUCTION FROM LASER-PRODUCED PLASMAS FOR LITHOGRAPHY APPLICATIONS, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 11(6), 1993, pp. 2986-2989
Citations number
7
Categorie Soggetti
Physics, Applied
Journal title
Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena → ACNP
ISSN journal
10711023
Volume
11
Issue
6
Year of publication
1993
Pages
2986 - 2989
Database
ISI
SICI code
1071-1023(1993)11:6<2986:SPFLPF>2.0.ZU;2-#
Abstract
Laser-produced plasmas are investigated as a source for soft x-ray pro jection lithography. The dependence of conversion efficiency on target material, intensity, wavelength, and pulse width is determined using absolutely calibrated detectors. Conversion efficiency greater than 1% into a 2.2 eV bandwidth is demonstrated for Sn targets, fulfilling th e system source requirements.