Ce. Allen et al., SURFACE-DIFFUSION OF IN ON SI(111) - EVIDENCE FOR SURFACE-IONIZATION EFFECTS, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 14(1), 1996, pp. 22-29
Citations number
46
Categorie Soggetti
Physics, Applied","Materials Science, Coatings & Films
Second harmonic microscopy has been used to quantify the surface diffu
sion of In on Si(111). At temperatures near 50% of the bulk melting te
mperature and in the coverage range 0<theta<0.7, the activation energy
E(diff) and pre-exponential factor D-0 lie at 42+/-0.5 kcal/mol and 3
X10(3+/-0.3) cm(2)/s, respectively. These parameters, which are quite
large, are explained semiquantitatively by reference to an adatom-vaca
ncy model recently developed for related systems. The present work, wh
en compared with the results of these other systems, offers significan
t evidence for the effects of adatom-vacancy ionization. (C) 1996 Amer
ican Vacuum Society.