Z. Gribnikov et A. Rothwarf, A NEW INTERMEDIATE STATE MODEL FOR THE GTO - RELATION TO THE TURN-OFFPROCESS, Solid-state electronics, 37(1), 1994, pp. 135-139
An intermediate state of the GTO is treated, that is characterized sim
ultaneously, by a negative gate current, high anode current, and rever
se biases on parts of both the n+p and pn-junctions. This state provid
es insight into the processes occurring during the storage and fall st
ages of turn-off. The intermediate state exists when a negative gate c
urrent is present that is insufficient to cause turn-off. Under these
circumstances there exists a boundary layer between the squeezed highl
y conducting on-region and the fully depleted off-region. It is this b
oundary layer that provides most of the holes for the gate current. an
d during the fall stage only this region is present. The mathematical
approach is based upon quasistationary equations and a quasi-one-dimen
sional approximation. The storage time, fall time and the width of the
boundary region are obtained for both high and low-injection regimes
This treatment is the first to clearly define the fall stage of turn-o
ff.